-
1
-
-
33749944166
-
A simple technique for the determination of mechanical strain in thin films with application to polysilicon
-
H. Guckel, T. Randazzo, "A simple technique for the determination of mechanical strain in thin films with application to polysilicon", J. Appl. Phys. 57(5), 1985, 1671 - 1675
-
(1985)
J. Appl. Phys.
, vol.57
, Issue.5
, pp. 1671-1675
-
-
Guckel, H.1
Randazzo, T.2
-
3
-
-
0029288648
-
Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface mircomaching application
-
M.Kirsten, B.Wenk, F. Ericson, J.A. Schweitz, W. Riethmuller, P. Lange, "Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface mircomaching application", Thin Solid Films 259(1995), 181-187
-
(1995)
Thin Solid Films
, vol.259
, pp. 181-187
-
-
Kirsten, M.1
Wenk, B.2
Ericson, F.3
Schweitz, J.A.4
Riethmuller, W.5
Lange, P.6
-
4
-
-
0031100301
-
Texture and stress profile in thick polysilicon films suitable for fabrication of microstructure
-
M. Furtsch, M. Offenberg, A. Cornet, J,R. Morante, "Texture and stress profile in thick polysilicon films suitable for fabrication of microstructure", Thin Solid Films 296(1997), 177-180
-
(1997)
Thin Solid Films
, vol.296
, pp. 177-180
-
-
Furtsch, M.1
Offenberg, M.2
Cornet, A.3
Morante, J.R.4
-
5
-
-
0026873781
-
Diagnostic microstructures for the measurement of intrinsic strain in thin films
-
H. Guckel, D. Burns, C. Rutigliano, E. Lovell, B. Choi, "Diagnostic microstructures for the measurement of intrinsic strain in thin films", J. Micromech. Microeng.2 (1992) 86-95
-
(1992)
J. Micromech. Microeng.
, vol.2
, pp. 86-95
-
-
Guckel, H.1
Burns, D.2
Rutigliano, C.3
Lovell, E.4
Choi, B.5
-
6
-
-
0027306533
-
A passive, in situ micro strain gauge
-
Liwei Lin, Roger T, Howe, Albert P. Pisano, "A Passive, In Situ Micro Strain Gauge", Proc. Micro Electro Mechanical Systems, 1993 201-206
-
(1993)
Proc. Micro Electro Mechanical Systems
, pp. 201-206
-
-
Lin, L.1
Roger, T.2
Howe3
Pisano, A.P.4
-
7
-
-
0029489921
-
Stress profile characterization and test structures analysis of single and double ion implanted LPCVD polycrystalline silicon
-
th international conference on solid-state sensors and actuators, and Eurosensor (1995), 88-91
-
(1995)
th International Conference on Solid-State Sensors and Actuators, and Eurosensor
, pp. 88-91
-
-
Benitez, M.A.1
Esteve, J.2
Benrakkad, M.S.3
Morente, J.R.4
Samitier, J.5
Schweitz, J.A.6
-
8
-
-
0032025522
-
Impact of high-thermal budget anneals on polysilicon as a micromechanical material
-
March
-
Yogesh B. Gianchandani, Meenam Shinn, Khalil Nahafi, "Impact of High-Thermal Budget Anneals on Polysilicon as a Micromechanical Material", Journal of microelectromechanical systems, vol 7, NO. 1, March 1998, 102-105
-
(1998)
Journal of Microelectromechanical Systems
, vol.7
, Issue.1
, pp. 102-105
-
-
Gianchandani, Y.B.1
Shinn, M.2
Nahafi, K.3
|