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Volumn 296, Issue 1-2, 1997, Pages 177-180
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Texture and stress profile in thick polysilicon films suitable for fabrication of microstructures
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Author keywords
Polysilicon; Stress; TEM; Texture; X ray diffraction; Raman
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Indexed keywords
ANNEALING;
DOPING (ADDITIVES);
EPITAXIAL GROWTH;
FILM GROWTH;
MORPHOLOGY;
PHOSPHORUS;
STRESS ANALYSIS;
TEXTURES;
THERMAL STRESS;
THICK FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY CRYSTALLOGRAPHY;
MICRO RAMAN SPECTROSCOPY;
MICROSTRUCTURES;
SILICON;
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EID: 0031100301
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)09341-8 Document Type: Article |
Times cited : (15)
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References (9)
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