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Volumn 296, Issue 1-2, 1997, Pages 177-180

Texture and stress profile in thick polysilicon films suitable for fabrication of microstructures

Author keywords

Polysilicon; Stress; TEM; Texture; X ray diffraction; Raman

Indexed keywords

ANNEALING; DOPING (ADDITIVES); EPITAXIAL GROWTH; FILM GROWTH; MORPHOLOGY; PHOSPHORUS; STRESS ANALYSIS; TEXTURES; THERMAL STRESS; THICK FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

EID: 0031100301     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09341-8     Document Type: Article
Times cited : (15)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.