Excimer-laser-induced lateral grain growth of silicon on large glass substrates and its application to thin film transistors

SID Conference Record of the International Display Research Conference

Volumn , Issue , 2001, Pages 395-398

  Takaoka, Hiromichi ^a   Sato, Yoshinobu ^a   Suzuki, Takaomi ^b   Sasaki, Takuya ^b   Tanabe, Hiroshi ^a   Hayama, Hiroshi ^a  

^a NEC CORPORATION   (Japan)

^b SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; GLASS; GROWTH (MATERIALS); LIQUID CRYSTAL DISPLAYS; SILICON;

SEQUENTIAL LATERAL SOLIDIFICATION (SLS);

THIN FILM TRANSISTORS;

EID: 0035782770     PISSN: 10831312     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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7. A. Hara et al, AM-LCD '01 Digest, p. 227.