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Volumn 4601, Issue , 2001, Pages 79-83
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Design, simulation and evaluation of novel corrugated diaphragms based on backside sacrificial layer etching technique
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Author keywords
Corrugated diaphragm; Couple field analysis; FEA; ICP; MEMS; Sacrificial etching
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Indexed keywords
ANISOTROPY;
COMPUTER SIMULATION;
COMPUTER SOFTWARE;
DIAPHRAGMS;
ETCHING;
FINITE ELEMENT METHOD;
INDUCTIVELY COUPLED PLASMA;
MICROMACHINING;
MICROPROCESSOR CHIPS;
SCARIFICIAL LAYER ETCHING (SLE) TECHNIQUES;
MICROELECTROMECHANICAL DEVICES;
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EID: 0035771672
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.444736 Document Type: Conference Paper |
Times cited : (4)
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References (6)
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