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Volumn 4593, Issue , 2001, Pages 145-155

Liga - A fabrication technology for industry?

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRODEPOSITION; FABRICATION; GOLD; LASER ABLATION; MICROSTRUCTURE; PHOTORESISTS; STRESS ANALYSIS; SYNCHROTRON RADIATION;

EID: 0035768550     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448845     Document Type: Conference Paper
Times cited : (7)

References (13)
  • 2
    • 0001631433 scopus 로고    scopus 로고
    • Mask prototyping for ultra-deep x-ray lithography: Preliminaty studies for mask blanks and high-aspect-ratio absorber patterns
    • C. Khan-Malek, Mask prototyping for ultra-deep x-ray lithography: preliminaty studies for mask blanks and high-aspect-ratio absorber patterns. SPIE Proc. 3512 (1998) 227-285.
    • (1998) SPIE Proc. , vol.3512 , pp. 227-285
    • Khan-Malek, C.1
  • 6
    • 0034851798 scopus 로고    scopus 로고
    • Profile Control of SUS-8 photoresist using different radiation sources
    • Z. Cui, D.W.K. Jenkins, A. Schneider, G. McBride, Profile Control of SUS-8 photoresist using different radiation sources. SPIE Proc. 4407 (2001) 119-125.
    • (2001) SPIE Proc. , vol.4407 , pp. 119-125
    • Cui, Z.1    Jenkins, D.W.K.2    Schneider, A.3    McBride, G.4
  • 7
    • 0010953663 scopus 로고    scopus 로고
    • http://www.cmf.rl.ac.uk/list1/liga.htm.
  • 10
    • 0034205540 scopus 로고    scopus 로고
    • Use of SU-8 photoresist for very high aspect ratio x-ray lithography
    • June
    • A.L. Bogdanov, S.S Peredkov, Use of SU-8 photoresist for very high aspect ratio x-ray lithography. Microelectronic Engineering, vol 53, no 1-4, June 2000, 493-4.
    • (2000) Microelectronic Engineering , vol.53 , Issue.1-4 , pp. 493-494
    • Bogdanov, A.L.1    Peredkov, S.S.2
  • 11
    • 0028950885 scopus 로고
    • Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics
    • W. Ehrfeld, H. Lehr, Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics. Radiat. Phys, Chem. Vol. 45, No 3, 1995, 349-365.
    • (1995) Radiat. Phys, Chem. , vol.45 , Issue.3 , pp. 349-365
    • Ehrfeld, W.1    Lehr, H.2
  • 12
    • 0033353368 scopus 로고    scopus 로고
    • The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks
    • S.K. Griffiths, J.M. Hruby, A. Ting, The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks. J. Micromech. Microeng. 9 353-361, 1999.
    • (1999) J. Micromech. Microeng. , vol.9 , pp. 353-361
    • Griffiths, S.K.1    Hruby, J.M.2    Ting, A.3
  • 13
    • 0000181711 scopus 로고
    • High energy lithography illumination by Oxford's synchrotron: A compact superconducting synchrotron x-ray source
    • Nov/Dec
    • D.E. Andrews, M.N. Wilson, High energy lithography illumination by Oxford's synchrotron: A compact superconducting synchrotron x-ray source. J. Vac. Sci. Technol. B 7 (6), Nov/Dec 1989, 1696-1701.
    • (1989) J. Vac. Sci. Technol. B , vol.7 , Issue.6 , pp. 1696-1701
    • Andrews, D.E.1    Wilson, M.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.