-
1
-
-
0022717983
-
X-ray litho. with PMMA
-
E.W. Becker, W. Ehrfeld, P. Hagmann, A. Maner, D. Munchmeyer, X-ray Litho. with PMMA. Microelectron. Eng. 4 (1986): 35.
-
(1986)
Microelectron. Eng.
, vol.4
, pp. 35
-
-
Becker, E.W.1
Ehrfeld, W.2
Hagmann, P.3
Maner, A.4
Munchmeyer, D.5
-
2
-
-
0001631433
-
Mask prototyping for ultra-deep x-ray lithography: Preliminaty studies for mask blanks and high-aspect-ratio absorber patterns
-
C. Khan-Malek, Mask prototyping for ultra-deep x-ray lithography: preliminaty studies for mask blanks and high-aspect-ratio absorber patterns. SPIE Proc. 3512 (1998) 227-285.
-
(1998)
SPIE Proc.
, vol.3512
, pp. 227-285
-
-
Khan-Malek, C.1
-
3
-
-
0000022101
-
SU-8 resist and x-ray LIGA technology to produce 1 mm high Ni gear wheels
-
Oct (IWMF 2000), Fribourg, Switzerland, ed FSRM-Swiss Foundation for Research in Microtechnology
-
nd Int. Workshop on Microfactories, Oct 2000 (IWMF 2000), Fribourg, Switzerland, p 141-144, ed FSRM-Swiss Foundation for Research in Microtechnology.
-
(2000)
nd Int. Workshop on Microfactories
, pp. 141-144
-
-
Schneider, A.1
Jenkins, D.W.K.2
Moody, R.A.3
Arthur, G.G.4
Cui, Z.5
Huq, S.E.6
Lawes, R.A.7
-
4
-
-
0038798179
-
-
K.Y. Lee, N. LaBianca, S.A. Rishto, S. Zolgharnain, J.D. Gelorme, J. Shaw, T.H-P. Chang, J. Vac. Sci. Technol. B 13 (1995): 3012.
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 3012
-
-
Lee, K.Y.1
LaBianca, N.2
Rishto, S.A.3
Zolgharnain, S.4
Gelorme, J.D.5
Shaw, J.6
Chang, T.H.-P.7
-
5
-
-
0031221057
-
-
H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, P. Vittiger, J. Micromech. Microeng. 7 (1997): 121.
-
(1997)
J. Micromech. Microeng.
, vol.7
, pp. 121
-
-
Lorenz, H.1
Despont, M.2
Fahrni, N.3
Labianca, N.4
Renaud, P.5
Vittiger, P.6
-
6
-
-
0034851798
-
Profile Control of SUS-8 photoresist using different radiation sources
-
Z. Cui, D.W.K. Jenkins, A. Schneider, G. McBride, Profile Control of SUS-8 photoresist using different radiation sources. SPIE Proc. 4407 (2001) 119-125.
-
(2001)
SPIE Proc.
, vol.4407
, pp. 119-125
-
-
Cui, Z.1
Jenkins, D.W.K.2
Schneider, A.3
McBride, G.4
-
7
-
-
0010953663
-
-
http://www.cmf.rl.ac.uk/list1/liga.htm.
-
-
-
-
9
-
-
0034763982
-
Deep x-ray lithography with SU-8 resist
-
L. Singleton, A. Bogdanov, S. Peredkov, O. Wilhelmi, A. Sneider, C. Cremers, S. Megtert, A. Schmidt, Deep x-ray lithography with SU-8 resist. SPIE Proc. 4343 (2001) 182-192.
-
(2001)
SPIE Proc.
, vol.4343
, pp. 182-192
-
-
Singleton, L.1
Bogdanov, A.2
Peredkov, S.3
Wilhelmi, O.4
Sneider, A.5
Cremers, C.6
Megtert, S.7
Schmidt, A.8
-
10
-
-
0034205540
-
Use of SU-8 photoresist for very high aspect ratio x-ray lithography
-
June
-
A.L. Bogdanov, S.S Peredkov, Use of SU-8 photoresist for very high aspect ratio x-ray lithography. Microelectronic Engineering, vol 53, no 1-4, June 2000, 493-4.
-
(2000)
Microelectronic Engineering
, vol.53
, Issue.1-4
, pp. 493-494
-
-
Bogdanov, A.L.1
Peredkov, S.S.2
-
11
-
-
0028950885
-
Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics
-
W. Ehrfeld, H. Lehr, Deep x-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics. Radiat. Phys, Chem. Vol. 45, No 3, 1995, 349-365.
-
(1995)
Radiat. Phys, Chem.
, vol.45
, Issue.3
, pp. 349-365
-
-
Ehrfeld, W.1
Lehr, H.2
-
12
-
-
0033353368
-
The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks
-
S.K. Griffiths, J.M. Hruby, A. Ting, The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks. J. Micromech. Microeng. 9 353-361, 1999.
-
(1999)
J. Micromech. Microeng.
, vol.9
, pp. 353-361
-
-
Griffiths, S.K.1
Hruby, J.M.2
Ting, A.3
-
13
-
-
0000181711
-
High energy lithography illumination by Oxford's synchrotron: A compact superconducting synchrotron x-ray source
-
Nov/Dec
-
D.E. Andrews, M.N. Wilson, High energy lithography illumination by Oxford's synchrotron: A compact superconducting synchrotron x-ray source. J. Vac. Sci. Technol. B 7 (6), Nov/Dec 1989, 1696-1701.
-
(1989)
J. Vac. Sci. Technol. B
, vol.7
, Issue.6
, pp. 1696-1701
-
-
Andrews, D.E.1
Wilson, M.N.2
|