Evolution of stress and microstructure in Ni/C multilayers used as X-ray optics in a wide energy range

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4501, Issue , 2001, Pages 118-126

  Dietsch, Reiner ^a   Holz, Thomas ^a   Weißbach, Danny ^a   Melov, Valeri ^b   Schreiber, Jürgen ^b   Scholz, Roland ^c  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b EADQ   (Germany)

^c MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Intrinsic stress; Ni C multilayer; Parallel beam X ray optics; PLD (Pulsed Laser Deposition); TEM; X ray mirror; XRD (X ray diffraction); XRR (X ray reflectometry)

Indexed keywords

CARBON; DELAMINATION; HEAT TREATMENT; INTERFACES (MATERIALS); MICROSTRUCTURE; MORPHOLOGY; NICKEL; PULSED LASER DEPOSITION; STRESSES; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY OPTICS;

EXTREME ULTRAVIOLET PROJECTION LITHOGRAPHY; INTRINSIC STRESS; PARALLEL BEAM X RAY OPTICS; X RAY MIRROR; X RAY REFLECTOMETRY;

MULTILAYERS;

EID: 0035764315     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448484     Document Type: Article

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