Real-time, in-situ microscopic observation of bubbles and roughening in KOH etching of silicon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4557, Issue , 2001, Pages 261-271

  Louro, Alvimar S ^a   Senna, J R ^b  

^a INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

^b INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

Anisotropic etching; KOH; Silicon etching; Surface roughness

Indexed keywords

BUBBLES (IN FLUIDS); MICROSCOPIC EXAMINATION; POTASSIUM COMPOUNDS; SILICON; SURFACE ROUGHNESS;

ANISOTROPIC ETCHING;

ETCHING;

EID: 0035763545     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.442954     Document Type: Article

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