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Volumn 4449, Issue , 2001, Pages 244-252
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Rapid X-Ray Reflectivity (XRR) characterization and process monitoring of multilayer Ta/Al2O3/Ta/SiO2/Si
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Author keywords
Al2O3; Density; High k dielectric; Roughness; Tantalum; X ray reflectivity (XRR)
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Indexed keywords
ALUMINA;
ALUMINUM;
DENSITY (SPECIFIC GRAVITY);
DIELECTRIC MATERIALS;
MONOCHROMATORS;
OXIDATION;
STOICHIOMETRY;
SURFACE ROUGHNESS;
TANTALUM;
THICKNESS MEASUREMENT;
X-RAY REFLECTIVITY;
X-RAY SOURCE;
X RAY ANALYSIS;
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EID: 0035761249
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.450101 Document Type: Article |
Times cited : (1)
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References (9)
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