The use of light scatter signals to identify particle material

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4449, Issue , 2001, Pages 131-139

  Stover, J C ^a   Ivakhnenko, V ^a   Eremin, Y A ^b  

^a ADE Corporation   (United States)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

Light scatter; Particle contamination; Particle scanner; PSL; Silicon wafer; True particle sizing

Indexed keywords

DEFECTS; IMPURITIES; LATEXES; OPTICAL VARIABLES MEASUREMENT; PARTICLE SIZE ANALYSIS; PARTICLES (PARTICULATE MATTER); POLYSTYRENES; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SPHERES;

DEFECT SIZING; LIGHT SCATTER SIGNALS; PARTICLE CONTAMINATION; PARTICLE SCANNER; TRUE PARTICLE SIZING;

LIGHT SCATTERING;

EID: 0035760770     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450086     Document Type: Article

References (5)

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3. Grishina N.V., Eremin Yu.A. Analysis of the Scattering Properties of Defects of Multilayered Substrates. Opt. Spectroscopy. 2000; 88: No.2.
4. Doicu A., Eremin Yu., Wriedt T. Acoustic and Electromagnetic Scattering Analysis Using Discrete Sources, Academic Press, 2000.
5. Mulholland, G.W., A. W. Hartman, G. G. Hembree, Egon Marx, T. R. Lettieri: "Development of a One-Micrometer-Diameter Particle Size Standard Reference Material"; J. of Res. NBS, V90, N1 p3 (1985).