Study of pupil filters for depth of focus enhancement in printing contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 783-791

  Wang, Chun Ming ^a   Yu, Shinn Sheng ^a   Yen, Anthony ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FOCUSING; MASKS; OPTICAL FILTERS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION; OPTIMIZATION;

CONTACT HOLES PRINTING; DEPTH OF FOCUS (DOF); FOCUS ENHANCEMENT; PUPIL FILTERS;

PHOTOLITHOGRAPHY;

EID: 0032625702     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354396     Document Type: Conference Paper

References (4)