Alt-PSM for 0.10 um and 0.13 um poly patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Schenker, Richard ^a   Kirchauer, Heinrich ^a   Stivers, Alan ^a   Tejnil, Edita ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; MASKS; PHASE SHIFT;

DEFECT PRINTABILITY; POLY PATTERNING; ZERNIKE PHASE ABERRATION;

PHOTOLITHOGRAPHY;

EID: 0033701327     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)