|
|
Volumn 14, Issue 3, 2001, Pages 463-467
|
|
Study of deprotection reaction during exposure in chemically amplified resists for lithography simulation
|
|
Author keywords
Activation energy; CA resist; Deprotection reaction; Simulation
|
|
Indexed keywords
ARTICLE;
ENERGY;
FOURIER ANALYSIS;
INFRARED SPECTROMETRY;
LITHOGRAPHY;
REACTION ANALYSIS;
SIMULATION;
TECHNOLOGY;
|
|
EID: 0035750994
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.14.463 Document Type: Article |
|
Times cited : (12)
|
|
References (14)
|
