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Journal of Photopolymer Science and Technology

Volumn 14, Issue 2, 2001, Pages 175-180

Synthesis of polysilane-acrylic copolymers by photopolymerization and their application to positive resists for EB lithography

(7) Matsuura, Yukihito a Tamai, Toshiyuki a Matsukawa, Kimihiro a Inoue, Hiroshi a Hamamoto, Tetsuya b Toyota, Hiroshi a Sato, Kazuo b

a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE (Japan)

b OSAKA SCIENCE AND TECHNOLOGY CENTER (Japan)

Author keywords

EB; Photopolymerization; Polysilane acrylic block copolymer; Positive resist

Indexed keywords

COPOLYMER; MONOMER; POLY(METHYL ALPHA CHLOROACRYLATE CO ALPHA METHYLSTYRENE); POLY(METHYLPHENYLSILANE); UNCLASSIFIED DRUG; VINYL DERIVATIVE;

ARTICLE; DECOMPOSITION; ELECTRON BEAM; FILM; HEAT TOLERANCE; MACROMOLECULE; PHOTOCHEMISTRY; POLYMERIZATION; SYNTHESIS;

EID: 0035746998 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.175 Document Type: Article

Times cited : (6)

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- note

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.