Direct measurement of resist pattern adhesion on the surface with silane-coupling treatment by atomic force microscope(AFM)

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 513-518

  Kawai, Akira ^a   Abe, Takato ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscope; Peeling; Surface energy

Indexed keywords

POLYMER; SILANE;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; ENERGY; MATHEMATICAL ANALYSIS; MEASUREMENT; MICROSCOPY; SCANNING ELECTRON MICROSCOPY;

EID: 0035746997     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.513     Document Type: Article

References (15)