Local mechanical-stress control (LMC): A new technique for CMOS-performance enhancement

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2001, Pages 433-436

  Shimizu, A ^a   Hachimine, K ^a   Ohki, N ^a   Ohta, H ^a   Koguchi, M ^a   Nonaka, Y ^a   Sato, H ^a   Ootsuka, F ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; ION IMPLANTATION; MOSFET DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING GERMANIUM; SILICON NITRIDE; STRESS RELAXATION;

DRIVABILITY; LOCAL MECHANICAL STRESS CONTROL;

CMOS INTEGRATED CIRCUITS;

EID: 0035715857     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)