In-situ study of the stiffness of alumina thin films during vapor depositio

Materials Research Society Symposium - Proceedings

Volumn 672, Issue , 2001, Pages

  Proost, Joris ^a   Spaepen, Frans ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; EVAPORATION; MICROCRACKS; SAPPHIRE; SILICON; STIFFNESS; SUBSTRATES; THIN FILMS;

AMORPHOUS ALUMINUM THIN FILM; BIAXIAL MODULUS; CONSTANT VALUE; ELECTRON BEAM EVAPORATION;

ALUMINA;

EID: 0035558742     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)