Phase diagrams for the optimization of rf plasma enhanced chemical vapor deposition of a-Si:H: Variations in plasma power and substrate temperature

Materials Research Society Symposium - Proceedings

Volumn 664, Issue , 2001, Pages

  Ferlauto, Andre S ^a   Koval, Randy J ^a   Wronski, Christopher R ^a   Collins, Robert W ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; ELLIPSOMETRY; HYDROGENATION; PHASE DIAGRAMS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; SUBSTRATES; SURFACE ROUGHNESS;

REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE);

THIN FILMS;

EID: 0035556387     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-664-a5.4     Document Type: Conference Paper

References (8)