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Volumn , Issue , 2001, Pages 301-305
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Cu metallization issues in low κ SiOC integration
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
COPPER;
METALLIZING;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PERMITTIVITY;
SECONDARY ION MASS SPECTROMETRY;
SUBSTRATES;
TITANIUM NITRIDE;
DIFFUSION BARRIERS;
DIELECTRIC MATERIALS;
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EID: 0035555406
PISSN: 10480854
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (8)
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