Investigation of the Copper drift in the low-κ polymers SILK I, J and H

Advanced Metallization Conference (AMC)

Volumn , Issue , 2001, Pages 465-470

  Bartha, J W ^a   Melzer, K ^a   Simmonds, M ^a   Radler, M ^a   Woods, R ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COPPER; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; METALLIZING; PERMITTIVITY; POLYMERS;

METAL INSULATOR SEMICONDUCTOR (MIS) STRUCTURES;

INTEGRATED CIRCUITS;

EID: 0035554830     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. Electrical reliability of Cu and Low-k dielectric integration
2. A Copper drift-modell for the low-κ polymer DVS BCB