Thermal plasma chemical vapor deposition of si-based ceramic coatings from liquid precursors

Plasma Chemistry and Plasma Processing

Volumn 21, Issue 4, 2001, Pages 523-546

  Bouyer, E ^a   Schiller, G ^a   Muller M ^a   Henne, R H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Atomization; Liquid disilane; Plasma synthesis; Rf plasma; Si3N4; SiC; SiO2

Indexed keywords

EID: 0035541880     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012047001193     Document Type: Article

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