Nanoimprint lithography of high-density cobalt dot patterns for fine tuning of dipole interactions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2779-2783

  Natali, M ^a   Lebib, A ^a   Cambril, E ^a   Chen, Y ^a   Prejbeanu, I L ^b   Ounadjela, K ^b  

^a CNRS   (France)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; LITHOGRAPHY; MAGNETIC FIELD EFFECTS; MAGNETIC MOMENTS; MAGNETIZATION; MAGNETOOPTICAL EFFECTS; MULTILAYERS; NANOTECHNOLOGY; NUCLEATION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING;

DIPOLE INTERACTIONS; FINE TUNING; HIGH DENSITY COBALT; MAGNETIC FORCE MICROSCOPY; NANOIMPRINT LITHOGRAPHY; VORTEX NUCLEATION ANNIHILATION;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0035519820     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421573     Document Type: Article

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