Outline of a variable-axis lens with arbitrary shift of the axis in one direction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2555-2565

  Schmid, Peter ^a   Rose, Harald ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRODES; ELECTRON DIFFRACTION; ELECTROSTATIC LENSES; FOCUSING;

STIGMATIC IMAGING; VARIABLE AXIS LENS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519818     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1418408     Document Type: Article

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