Spun-on carbon antireflective layer with etch resistance for deep and vacuum ultraviolet lithography processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2385-2388

  Sato, Yasuhiko ^a   Onishi, Yasunobu ^a   Nakano, Yoshihiko ^a   Hayase, Shuzi ^b  

^a TOSHIBA CORPORATION   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CARBON; COMPOSITION; DRY ETCHING; EXCIMER LASERS; GLASS; REFRACTIVE INDEX; SYNTHESIS (CHEMICAL); THERMOOXIDATION; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

DEEP ULTRAVIOLET LITHOGRAPHY; ETCH RESISTANCE; NOVOLAK FILM; REDUCTIVE COUPLING; SPUN ON CARBON ANTIREFLECTIVE LAYER; SPUN ON GLASS; VACUUM ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 0035519513     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412900     Document Type: Article

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