Reactive ion etch studies of DUV resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1209-1214

  Kwong, Ranee ^a   Moreau, Wayne ^a   Yan, Wendy ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; REACTIVE ION ETCHING; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) RESISTS;

PHOTORESISTS;

EID: 0032686703     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350172     Document Type: Conference Paper

References (16)