Wall-dependent etching characteristics of organic antireflection coating in O2+halogen/hydrogen halide plasma

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2893-2899

  Xu, S ^a   Lill, T ^a   Podlesnik, D ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FREE RADICALS; ORGANIC COATINGS; OXYGEN; PLASMA DIAGNOSTICS; PLASMA ETCHING; PLASMA STABILITY; SILICON WAFERS; SURFACE REACTIONS;

CRITICAL DIMENSIONS (CD);

ANTIREFLECTION COATINGS;

EID: 0035508546     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412655     Document Type: Article

References (9)