Thermomechanical properties of a-Si:H and a-Ge:H

Thin Solid Films

Volumn 398-399, Issue , 2001, Pages 549-552

  De Lima M M , Jr ^a   Marques, F C ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Amorphous germanium; Amorphous silicon; Elastic modulus; Thermal expansion coefficient

Indexed keywords

AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; GERMANIUM; STRAIN; STRESS ANALYSIS; THERMAL EXPANSION;

THERMOMECHANICAL PROPERTIES;

AMORPHOUS FILMS;

EID: 0035507133     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01369-4     Document Type: Conference Paper

References (14)