Stress and thermomechanical properties of amorphous hydrogenated germanium thin films deposited by glow discharge

Journal of Applied Physics

Volumn 84, Issue 6, 1998, Pages 3118-3124

  Marques, F C ^a,b   Wickboldt, P ^a,c   Pang, D ^a   Chen, J H ^a   Paul, W ^a  

^a HARVARD UNIVERSITY   (United States)

^b UNIVERSITY OF CAMPINAS   (Brazil)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001437977     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368466     Document Type: Article

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