Nitrogen-doped plasma enhanced chemical vapor deposited (PECVD) amorphous carbon: Processes and properties

Thin Solid Films

Volumn 398-399, Issue , 2001, Pages 163-169

  Smith, Steven M ^a   Voight, Steven A ^a   Tompkins, Harland ^a   Hooper, Andy ^a   Talin, A Alec ^a   Vella, Joseph ^a  

^a MOTOROLA INC   (United States)

Author keywords

Amorphous carbon; Diamond like carbon (DLC); Hard coatings; Plasma enhanced carbon vapor deposition (PECVD)

Indexed keywords

EMISSION SPECTROSCOPY; FILM GROWTH; GROUNDING ELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; THIN FILMS;

OPTICAL EMISSION SPECTROSCOPY (OES);

DIAMOND LIKE CARBON FILMS;

EID: 0035506418     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01425-0     Document Type: Article

References (17)