Embedded mask for application in high-frequency integrated circuits using UV positive resist technology

Journal of Micromechanics and Microengineering

Volumn 10, Issue 3, 2000, Pages 334-336

  Alderman, B E J ^a   Mann, C M ^b   Oldfield, M L ^b   Chamberlain, J M ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; MASKS;

HIGH-FREQUENCY INTEGRATED CIRCUITS;

PHOTORESISTS;

EID: 0034273241     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/3/306     Document Type: Article

References (7)

1. Roth S, Dellmann L, Racine G-A and de Rooij N F 1999 J. Micromech. Microeng. 9 105-8
2. Digby J W 1999 Construction of an integrated down-converter for operation at 200 GHz PhD Thesis University of Nottingham, UK unpublished
3. Guckel H, Christenson T R, Skrobis K J, Klein J and Karnowsky M 1993 Tech. Digest 7th Int. Conf. on Solid-State Sensors and Actuators (Yokohama, 1993) pp 76-9
4. Longhurst R S 1973 Geometrical and Physical Optics 3rd edn (London: Longman)
5. Moon S W, Mann C M, Maddison B J, Turcu I C E, Allot R, Huq S E and Lisi N 1996 Terahertz waveguide components fabricated using a 3D x-ray microfabrication technique Electron. Lett. 32 1794-5
6. Moechst High-Resolution Thick Resist AZ 9200-series 1997 Hoechst product information sheet
7. Moreau M W 1988 Semiconductors Lithography Principles (New York: Plenum) pp 329-33