Quantitative evaluation of strain near reconstructed Si surfaces

Surface Science

Volumn 493, Issue 1-3, 2001, Pages 221-226

  Emoto, Takashi ^a   Akimoto, Koichi ^a   Ishikawa, Yuya ^a   Ichimiya, Ayahiko ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Surface relaxation and reconstruction; Surface stress; X ray scattering, diffraction, and reflection

Indexed keywords

STRAIN MEASUREMENT; SUBSTRATES; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

SURFACE RELAXATION;

SEMICONDUCTING SILICON;

EID: 0035500520     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01220-1     Document Type: Conference Paper

References (17)