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Volumn 31, Issue 10, 2001, Pages 1089-1094

Electrochemical behaviour of copper in trimethyl-n-hexylammonium bis((trifluoromethyl)sulfonyl)amide, an ammonium imide-type room temperature molten salt

(4) Murase, K a Nitta, K a Hirato, T a Awakura, Y a

a KYOTO UNIVERSITY (Japan)

Author keywords

Electrodeposition; Ionic liquids; Nonaqueous solution; Redox

Indexed keywords

DISSOLUTION; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROPLATING; MOLTEN MATERIALS;

MOLTEN SALTS; MONOVALENT COPPER IONS;

COPPER;

EID: 0035471571 PISSN: 0021891X EISSN: None Source Type: Journal
DOI: 10.1023/A:1012255601793 Document Type: Article

Times cited : (95)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.