Electroless plating Ni induced crystallization of amorphous silicon thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 9 A, 2001, Pages 5244-5246

  Chen, Y C ^a   Sermon Wu, Y C ^a   Chao, C W ^a   Hu, G R ^a   Feng, M S ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Electroless plating Ni; Metal induced crystallization (MIC); Ni Silicide; Physical vapor deposition (PVD); Poly Si

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; ELECTROLESS PLATING; NICKEL; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY; METAL INDUCED CRYSTALLIZATION;

POLYSILICON;

EID: 0035457012     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5244     Document Type: Article

References (11)