On the influence of the e-beam writer address grid on the optical quality of high-frequency gratings

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 327-333

  Schnabel, Bernd ^a,b   Kley, Ernst Bernhard ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b Vistec Electron Beam GmbH   (Germany)

Author keywords

Electron beam lithography; Grating ghosts; High frequency gratings

Indexed keywords

BIREFRINGENCE; DIFFRACTION GRATINGS; OPTICAL RESOLVING POWER; SPECTRUM ANALYSIS;

HIGH-FREQUENCY GRATINGS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035450640     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00520-2     Document Type: Article

References (9)

1. Subwavelength structured surfaces and their applications
2. Subwavelength structured elements
3. A fabrication technique for high aspect ratio gratings
4. Polarizing visible light by subwavelength-period metal-stripe gratings
5. Inverse metal-stripe polarizers
6. High-efficiency dielectric reflection gratings: Design, fabrication, and analysis
7. Efficient coupling into polymer waveguides by gratings
8. Application of metallic subwavelength gratings for polarization devices