Intermittence effect in electron beam writing

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 321-326

  Wittig, L C ^a   Cumme, M ^a   Harzendorf, T ^a   Kley, E B ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

e beam writing; Grey tone lithography; HEBS glass

Indexed keywords

FABRICATION; GLASS; MASKS; RELAXATION PROCESSES;

ELECTRON BEAM WRITING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035450639     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00511-1     Document Type: Article

References (2)

1. Continuous profile writing by electron and optical lithography
2. One-step lithography for mass production of multilevel diffractive optical elements using high energy beam sensitive (HEBS) grey-level masks