Application of the partial wave expansion method in 3-D low energy electron beam lithography simulation

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 297-302

  Zianni, X ^a   Velessiotis, D ^a   Glezos, N ^a   Trohidou, K N ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b INSTITUTE OF MATERIALS SCIENCE   (Greece)

Author keywords

Low energy electron beam lithography; Partial wave expansion method

Indexed keywords

PARTIAL WAVE EXPANSIO METHOD (PWEM);

COMPUTER SIMULATION; ELECTRON BEAMS; ELECTRON SCATTERING; MONTE CARLO METHODS; SUBSTRATES;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035450390     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00499-3     Document Type: Article

References (11)