Construction of microcolumn system and its application to nanolithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 485-488

  Lee, Y J ^a   Kang, S H ^a   Kim, D H ^a   Park, J Y ^b   Choi, H J ^b   Kuk, Y ^b   Chun, K ^a  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON OPTICS; LENSES; LITHOGRAPHY; POLYMETHYL METHACRYLATES;

MICROCOLUMN SYSTEM;

NANOTECHNOLOGY;

EID: 12844268825     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00113-0     Document Type: Article

References (9)

1. L. P. Muray, U. Staufer, D. P. Kern and T. H. P. Chang, J. Vac. Sci. Technol. B 9(6), Nov/Dec 1991
2. T. H. P. Chang, D. P. Kern and L. P. Muray, J. Vac. Sci. Technol. B 10(6), Nov/Dec 1992
3. E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, M. L. Yu and T. H. P. Chang, J. Vac. Sci. Technol. B 12(6), Nov/Dec 1994
4. T. H. P. Chang, M. G. R. Thomson, E. Kratschmer, H. S. Kim, M. L. Yu, K. Y. Lee, S. A. Rishton, and B. W. Hussey, J. Vac. Sci. Technol. B 14(6), Nov/Dec 1996
5. C. R. K. Marrian et al, Appl. Phys. Lett., 56(8), 19, 1990
6. H. Seidel, Transducers '87, Rec. of the 4th Int. Conf. On Solid-State Sensors and Actuators, 1987
7. G. Wallis et.al, Electrochem. Sci. and Technol., 2(1975)
8. Shuichi Snon and Masayoshi Esashi, Technical Digest of the 9th Sensor Symposium
9. P. A. Peterson, Z. J. Radzimski, S. A. Schwalm, and P. E. Russell, J. Vac. Sci.Technol. B 10(6), Nov/Dec 1992