Effect of nitrogen partial pressure on the electrochemical evaluation of (Ti-Al)N coatings deposited by reactive magnetron sputtering

Transactions of the Institute of Metal Finishing

Volumn 79, Issue 5, 2001, Pages 190-194

  Singh, K ^a   Grover, A K ^a   Totlani, M K ^a   Suri, A K ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Corrosion test; Sputtering; Titanium aluminium nitride

Indexed keywords

CORROSION RESISTANCE; CURRENT DENSITY; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; MICROHARDNESS; NITROGEN; PARTIAL PRESSURE; STAINLESS STEEL; SUBSTRATES; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

TITANIUM ALUMINUM NITRIDE FILMS;

COATINGS;

EID: 0035446438     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1080/00202967.2001.11871392     Document Type: Article

References (29)

1. Conf.: Value-addition metallurgy