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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2259-2266

Diffusion of TiN into aluminum films measured by soft x-ray spectroscopy and rutherford backscattering spectroscopy

(8) Schuler, T M a Ederer, D L a Ruzycki, N a Glass, G b Hollerman, W A b Moewes, A c Kuhn, M d Callcott, T A e

a Tulane University (United States)

b UNIVERSITY OF LOUISIANA AT LAFAYETTE (United States)

c LOUISIANA STATE UNIVERSITY (United States)

d HEWLETT PACKARD COMPANY (United States)

e UNIVERSITY OF TENNESSEE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DIFFUSION; ELECTRONIC STRUCTURE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM NITRIDE; X RAY SPECTROSCOPY;

NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE (NEXAFS);

THIN FILMS;

EID: 0035441989 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1382875 Document Type: Article

Times cited : (2)

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