New in situ measurement method for nanoparticles formed in a radio frequency plasma-enhanced chemical vapor deposition reactor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1998-2000

  Seol, Kwang Soo ^a   Tsutatani, Yasuyuki ^a   Fujimoto, Toshiyuki ^a   Okada, Yoshiki ^a   Takeuchi, Kazuo ^a   Nagamoto, Hidetoshi ^b  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b KOGAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CHARGE TRANSFER; CHARGED PARTICLES; CHEMICAL REACTORS; ELECTRIC CHARGE; EPITAXIAL GROWTH; PARTICLE SIZE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DEVICE MANUFACTURE;

VERY LOW-PRESSURE DIFFERENTIAL MOBILITY ANALYZERS (VLPDMA);

NANOSTRUCTURED MATERIALS;

EID: 0035440465     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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