Transport properties of μc-Si:H films prepared by very high hydrogen-diluted silane plasma

Chinese Physics

Volumn 10, Issue 8, 2001, Pages 748-750

  Shi, Jian Jun ^a   Huang, Shao Yun ^a   Chen, Kun Ji ^a   Huang, Xin Fan ^a   Xu, Jun ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

Conductivity; Microcrystalline silicon; Mobility; Travelling wave method

Indexed keywords

MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILANES; X RAY DIFFRACTION ANALYSIS;

DARK CONDUCTIVITY; DRIFT MOBILITY; MICROCRYSTALLINE SILICON FILMS; TRAVELLING WAVE METHOD;

THIN FILMS;

EID: 0035429947     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/10/8/316     Document Type: Article

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