Influence of Bi2O3 in the microstructure of SrBi2Ta2O3 films deposited by pulsed laser ablation

Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 8, 2001, Pages 461-465

  Cruz Jauregui M P ^a   Siqueiros, J M ^b   Portelles, J ^b  

^a CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

POLYCRYSTALLINE GROWTH; POST ANNEALING TREATMENT; TEMPERATURE INDUCED PREFERENTIAL GROWTH;

ANNEALING; BISMUTH COMPOUNDS; COMPOSITION EFFECTS; CRYSTAL GROWTH; CRYSTAL ORIENTATION; FILM PREPARATION; LASER ABLATION; MICROSTRUCTURE; PULSED LASER DEPOSITION; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

STRONTIUM COMPOUNDS;

EID: 0035428584     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012220716255     Document Type: Article

References (15)