Influence of sulphonation on polymer and polymer blend surfaces studied by atomic force microscopy

Surface and Interface Analysis

Volumn 32, Issue 1, 2001, Pages 144-147

  Wee, A T S ^a   Guo, Y P ^a   Tan, K C ^a   Wang, H Q ^a   Leong, T K ^a   Huan, C H A ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Atomic force microscopy; Poly(methyl methacrylate); Polymer blends; Polystyrene; Sulphonation; Wettability

Indexed keywords

ACETIC ACID; ATOMIC FORCE MICROSCOPY; PLASTIC FILMS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SILICON WAFERS; SOLVENTS; SPIN COATING; SULFURIC ACID; SURFACE CHEMISTRY; WETTING;

COATING TOPOGRAPHY;

POLYMER BLENDS;

EID: 0035419939     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1025     Document Type: Article

References (7)