Preparation of platinum silicide films by pulsed laser deposition and pulsed laser annealing

Materials Chemistry and Physics

Volumn 72, Issue 1, 2001, Pages 85-87

  Li, Mei Cheng ^a   Chen, Xuekang ^b   Cai, Wei ^a   Yin, Jinghua ^a   Yang, Jianping ^b   Wu, Gan ^b   Zhao, Liancheng ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Laser annealing; Nanometer thin film; Pulsed laser deposition

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DIFFUSION; FILM GROWTH; FILM PREPARATION; PHASE INTERFACES; PLATINUM COMPOUNDS; PULSED LASER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOMETER THIN FILMS; PULSED LASER ANNEALING;

ULTRATHIN FILMS;

EID: 0035419455     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(01)00300-5     Document Type: Article

References (13)