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Solid-State Electronics

Volumn 45, Issue 8, 2001, Pages 1207-1217

Ultra-thin SiO2 film studies: Index, thickness, roughness and the initial oxidation regime

(1) A Irene, Eugene a

a University of North Carolina at Chapel Hill (United States)

Author keywords

Silicon dioxide properties; Ultra thin silicon dioxide films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON TUNNELING; ELLIPSOMETRY; FRACTALS; OXIDATION; SILICA; SURFACE ROUGHNESS;

SPECTROSCOPIC ELLIPSOMETRY (SE);

ULTRATHIN FILMS;

EID: 0035416579 PISSN: 00381101 EISSN: None Source Type: Journal
DOI: 10.1016/S0038-1101(00)00258-6 Document Type: Article

Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.