Si/SiO2 interface roughness study using Fowler-Nordheim tunneling current oscillations

Journal of Applied Physics

Volumn 87, Issue 3, 2000, Pages 1159-1164

  Lai, L ^a   Irene, Gene ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000670224     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371993     Document Type: Article

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