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Volumn 229, Issue 1, 2001, Pages 1-5
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FZ-Si crystal growth and HREM study of new types of extended defects during in situ electron irradiation
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Author keywords
A1. Planar defects; A1. Point defects; A2. Floating zone technique; B2. Semiconducting silicon
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Indexed keywords
CRYSTAL GROWTH FROM MELT;
CRYSTAL ORIENTATION;
HIGH RESOLUTION ELECTRON MICROSCOPY;
INTERFACES (MATERIALS);
POINT DEFECTS;
SEMICONDUCTOR GROWTH;
FLOATING ZONE TECHNIQUES;
SEMICONDUCTING SILICON;
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EID: 0035398760
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)01039-9 Document Type: Article |
Times cited : (4)
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References (16)
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