Study on temperature calibration of a silicon substrate in a temperature programmed desorption analysis

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1255-1260

  Hirashita, N ^a   Jimbo, T ^a   Matsunaga, T ^a   Matsuura, M ^a   Morita, M ^a   Nishiyama, I ^a   Nishizuka, M ^a   Okumura, H ^a   Shimazaki, A ^a   Yabumoto, N ^a  

^a Ultraclean Society   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; DECOMPOSITION; DESORPTION; LAMINATING; MATERIALS TESTING LABORATORIES; SUBSTRATES; TEMPERATURE CONTROL; TEMPERATURE PROGRAMMED DESORPTION; THERMAL EFFECTS;

STRUCTURAL TRANSFORMATIONS; TEMPERATURE CALIBRATION;

SILICON WAFERS;

EID: 0035394821     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1380231     Document Type: Article

References (15)