Desorption kinetics of Ar implanted into Si

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 2 A, 1999, Pages 613-617

  Hirashita, Norio ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Activation energy; Ar implanted into Si; Desorption; Kinetics; Structural transformation; TDS

Indexed keywords

EID: 4243618985     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.613     Document Type: Article

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