Plasma etching of lead germanate (PGO) ferroelectric thin film

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1341-1345

  Ying, Hong ^a   Li, Tingkai ^a   Maa, Jer Shen ^a   Zhang, Fengyan ^a   Hsu, Sheng Teng ^a   Gao, Yufei ^b   Engelhard, Mark ^b  

^a SHARP LABORATORIES OF AMERICA   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; CONCENTRATION (PROCESS); ELECTRON CYCLOTRON RESONANCE; FERROELECTRIC MATERIALS; FLUORINE; KINETIC ENERGY; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SILICON WAFERS; SPUTTERING;

PLASMA REACTORS;

FERROELECTRIC THIN FILMS;

EID: 0035394343     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1355363     Document Type: Article

References (9)