Effect of temperature on etch rate of iridium and platinum in CF4/O2

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1312-1314

  Maa, J S ^a   Ying, H ^a   Zhang, F ^a  

^a SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON CYCLOTRON RESONANCE; HIGH TEMPERATURE EFFECTS; IRIDIUM; PLASMA ETCHING; PLATINUM; SILICON WAFERS;

WAFER CHUCKS;

FERROELECTRIC MATERIALS;

EID: 0035394342     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1353541     Document Type: Article

References (11)